He, Kr, Xe, Ar, Ne lines available
Manipulator with six axes of motion and closed cycle cryostat reaching 5K
DA30 electron analyzer
In situ alkali evaporation
Future: x-ray source for XPS
Future: in situ LEED
Used for the growth of single-monolayer-thick WS2 and WSe2 films on wafers up to 3” in diameter
Metal-organic chemical vapor deposition (MOCVD) 1 Used for the growth of single-monolayer-thick MoS2 and MoSe2 films on wafers up to 3” in diameter
MBE of any 11 of 62 elements (colored in periodic table below) at one time and refills without breaking chamber vacuum
Tsub < 1000 °C
Poxidant < 10–5 Torr
National Science Foundation (Platform for the Accelerated Realization, Analysis, and Discovery of Interface Materials (PARADIM)) under Cooperative Agreement No. DMR-2039380.
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